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resistance of photopolymeric stamps.

Ivanchyshyn M. H., Maik V. Z., Lazarenko E. T. (Ukrainska akademiia drukarstva (UAD, Lviv, Ukraina)
Wear resistance of photopolymeric stamps. — 2008. — № 1(19). — pp. 29—33.
   

 It is investigated changes of photopolymeric stamps during a stamping.
     Language — Ukrainian.
     Illustrations — 3.
     Table — 2.
     Bibliography — 7 titles.

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